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Semiconductor Wafer Temperature
Measurement
• Non Contact Infrared Thermometer
• Automatically Measures Temperature
& Emissivity
• Temperature Range: 250°C -
1500°C
• Temperature Accuracy: ±3°C
• 6 Spectral Wavelengths
Available: 808, 850, 905, 940,
980, and 1550nm
• Data Acquisition Rate to 1ms
• Digital RS232 PC Interface
• Output 70 Readings Per Second
to Host PC
• Target Spot Sizes From 0.25”
and Larger
• Fiber Optic Sensor Temperature
Measurement
• Other
Process Applications include Wafer
Rotation
Speed and Process Operating Fault Conditions
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Optitherm III
Datasheet
(80KB)
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Classification: semiconductor wafer temperature
measurement, fiber optic, non contact infrared
thermometer.

The Optitherm® III infrared
thermometer temperature measurement system uses
fiber optics and the latest pulsed laser infrared
technology to measure precisely a single or
multi-wafer temperature during in-situ epitaxial
growth in CVD, MBE and MOCVD applications. While all
passive infrared thermometer instruments measure a
target radiance temperature, the Optitherm®
determines dynamically the emissivity value of a
specular target resulting in unmatched wafer
temperature measurement accuracy to ±3°C for
temperature control.
The Optitherm® incorporates an active
reflectometer technique to determine the target
emissivity (E%) and true temperature (Te). This is
accomplished by automatically measuring the target
specular reflectivity at the same time, location and
wavelength as the infrared radiation temperature
measurement to determine the true wafer temperature.
The microprocessor collects these values at an
extremely fast 1ms data acquisition rate and
transmits data to host PC for temperature
calculation, data logging and immediate process
temperature control.
The Optitherm® infrared technology can be
implemented into a variety of in-situ semiconductor
applications including production tools, wafer
processing, research and development anywhere
accurate temperature measurements are critical.
Other process fabrication applications for the
Optitherm® include wafer rotation and speed, wafer
alignment (out of position) and process fault
operating conditions.

• Semiconductor Temperature Wafer Measurement
• Improve economics and quality control of wafer
fabrication and manufacturing
• Production, Research & Development of Wafers
• Monitor growth rate and layer thickness
• Temperature measurement of epitaxial growth
in:
- CVD Reactors
- MBE Reactors
- MOCVD Reactors
• Specular Targets and Substrates
• Process Fault Conditions including wafer
rotation, speed, alignment and positioning
ADVANTAGES
• Measures Rapidly Changing Emissivity During
Layer Growth Providing Accurate Temperature
Determination
• Waveband Selection Based on Target Material
Properties
• Emissivity Channel Can Be Field Calibrated
• Rapid Response Time
COMPATIBLE SUBSTRATES
• Silicon • Silicon Carbide • Silicon Nitride •
Indium Arsenide • Gallium Arsenide • Gallium
Nitride
• Indium Phosphide • Germanium • Highly Polished
Metals


TECHNOLOGY
The Optitherm® III uses a patented laser
based infrared technology to determine the
emissivity and true temperature (Te) of the
target.
A low-powered pulsed GaAs pulsed laser is fired
at the target measuring zone via a dedicated
optical path (Laser Channel) and both the laser
return signal and infrared radiance signal are
detected via a secondary optical path (Radiance
Channel); the laser signal being (AC) on top of
the (DC) target signal. Having monitored the
laser outgoing energy and knowing the geometry
involved (including target distance). The
Optitherm® can determine the specular
reflectivity and thus the emissivity of the
target measuring zone. The wave band of the
collected target radiance is limited to a narrow
band centered in the laser wavelength depending
on the specific application offering the highest
degree of accuracy.
The Optitherm® internal software
includes five (5) modes of operation: Remote Control
for host PC command driven
operational and process control, Auto Mode for
continuous data output at selectable integration
time, Single Mode for single shot temperature
measurements, Interval Mode for dedicated time
sequencing measurements and Off-Line Mode for setup
and calibrations functions. Host PC communication
software available.
TYPICAL INSTALLATION
(A) Single Axis Sensor must be perpendicular
to the target.
(B) Dual Axis Sensors with symmetric angles
to the target.
Note: This may require compensation for
polarization.

- The
Optitherm® IR thermometer comes complete
factory calibrated traceable to NIST
Standards.
- Optional
"Certificate of Calibration" per point to
NIST Standards can also be provided.
- Expert
factory service is also available for
periodic calibration.

The
Optitherm® non contact infrared thermometer
comes complete and ready to use with:
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Standard
Temperature Range
-
19" Rack Mount
Enclosure
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Keypad, Digital
Display
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Electronics
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Fiber Optic Sensor Head and
cables
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Operating
Software
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Output: One
Analog: 0-5VDC or 0-20mA
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Output Digital:
RS232
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Target
Distance: To Suit Application
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Target Spot
Size: To Suit Application
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Instruction
Manual
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Statement Of
Calibration

Good performance and reliability are
what you expect when you buy precision products from
The Pyrometer Instrument Company, Inc.. The
Optitherm® III infrared thermometer comes complete
with a one year factory warranty. For complete
details visit our Product
Warranty Page.
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